PRODUCT CENTER
Product series
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ITO Target/Powder
ITO target is a functional indium tin oxide ceramic material, which is used for preparation of ITO transparent conductive thin film by magnetron sputtering.
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AZO Target/Powder
AZO target is a functional zinc aluminum oxide ceramic material, which is used for preparation of AZO transparent conductive thin film by magnetron sputtering.
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TZO Target/Powder
With plasma as the heat source, high purity and high density TZO target is produced from respective powders.
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ZrOx Target
With plasma as the heat source, high purity and high density ZrOx or SiZr targets are produced from respective powders.
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Rotary SiZr Target
With plasma as the heat source, high purity and high density SiZr targets are produced from respective powders.
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SiAI Target
With plasma as the heat source, high purity and high density Si or SiAI targets are produced from respective powders.
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Rotary Si Target
With plasma as the heat source, high purity and high density Si targets are produced from respective powders.
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NbOx Target
With plasma as the heat source, high purity and high density NbOx targets are produced from respective powders.
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Rotatable Ag Target
With plasma as the heat source, high purity and high density Ag targets are produced from respective powders
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Telcera Product Advantage
Mature technology
Master the synthesis technology of raw material powders, as well as the secondary treatment technology of outsourced powders (such as improving agglomeration and sintering activity).
Development ability
It has mature mass production technology and Know-How, and has the ability to develop thin film metallization technology and target materials.
Product advantage
It has the advantages of high strength, good insulation, excellent thermal conductivity and heat resistance, small coefficient of thermal expansion, and good chemical stability.
Process experience
The technical and production management team has rich experience in slurry preparation, cast forming, sintering, and ceramic metallization.
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